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Tuesday, November 3, 2020 | History

5 edition of Gas-Phase and Surface Chemistry in Electronic Materials Processing found in the catalog.

Gas-Phase and Surface Chemistry in Electronic Materials Processing

Symposium Held November 29-December 2, 1993, Boston, Massachusetts, U.S.A. (Mate)

by T. J. Mountziaris

  • 268 Want to read
  • 37 Currently reading

Published by Materials Research Society .
Written in English

  • Surface chemistry,
  • Science,
  • Congresses,
  • Science/Mathematics,
  • Surfaces,
  • SCI013000,
  • SCI,
  • Chemistry - General,
  • Electronics,
  • Materials

  • Edition Notes

    ContributionsF. T. J. Smith (Contributor)
    The Physical Object
    Number of Pages556
    ID Numbers
    Open LibraryOL8608873M
    ISBN 101558992332
    ISBN 109781558992337

    Materials and Processing for Gate Dielectrics on Silicon Carbide (SiC) Surface, Physics and Technology of Silicon Carbide Devices, Yasuto Hijikata, IntechOpen, DOI: / Available from: Sanjeev Kumar Gupta, Jitendra Singh and Jamil Akhtar (October 16th ).Cited by: 7. Electronic Materials & Photonics Division; A discussion of the methods for achieving uniformity in each of these reactors illustrates the differing importance of gas-phase and surface processes. Most of the remainder of the day is devoted to considering the properties of the layers important in IC applications and how they are influenced by. The work function of the tungsten-oxygen system has been investigated at temperatures of , and °C vs. oxygen partial pressure within the stability range of various oxide phases. The Cited by: 8.

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Gas-Phase and Surface Chemistry in Electronic Materials Processing by T. J. Mountziaris Download PDF EPUB FB2

Gas-phase and surface chemistry in electronic materials processing. Pittsburgh, Pa.: Materials Research Society, © (OCoLC) Material Type: Conference publication, Internet resource: Document Type: Book, Internet Resource: All Authors / Contributors: Triantafillos John Mountziaris; Materials Research Society.

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Chemical functionalization of ZnO surface with an alkyne functional group was successfully achieved by exposing ZnO nanopowder to gas-phase propiolic acid in vacuum, which left the alkyne group available for subsequent chemical modification via the azide–alkyne cycloaddition “click” reaction with benzyl azide.

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Gas phase ion chemistry is a field of science encompassed within both chemistry and is the science that studies ions and molecules in the gas phase, most often enabled by some form of mass far the most important applications for this science is in studying the thermodynamics and kinetics of reactions.

For example, one application is in studying the thermodynamics of. Publisher Summary. This chapter discusses the gas phase and surface chemistry of the Chemical Vapor Deposition (CVD) of epitaxial silicon. CVD is an important industrial process in the manufacture of thick and thin solid films of advanced electronic and photonic materials.

Carbon-based honeycomb monoliths can be integral or carbon-coated ceramic monoliths, and they take advantage of the versatility of the surface area, pore texture and surface chemistry of carbon materials. Here, we review the preparation methods of these monoliths, Cited by: This book covers a broad spectrum of the silicon-based materials and their device applications.

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The aspect of most interest to scientists is the basic interac­ tion mechanisms between the intense light of a laser and materials exposed to a chemically reactive or nonreactive surrounding me­. The Supporting Information is available free of charge on the ACS Publications website at DOI: /ter.6b Description of the quadrupole mass spectrometry (QMS) experimental setup, performed measurements, and data analysis; determined mass spectra of the reaction products, including comparison with spectra found in the NIST database; conclusion of which species are likely Cited by: 9.

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@article{osti_, title = {MOLECULAR SPECTROSCPY AND REACTIONS OF ACTINIDES IN THE Gas-Phase and Surface Chemistry in Electronic Materials Processing book PHASE AND CRYOGENIC MATRICES}, author = {Heaven, Michael C and Gibson, John K and Marcalo, Joaquim}, abstractNote = {In this chapter we review the spectroscopic data for actinide molecules and the reaction dynamics for atomic and molecular actinides that have been examined in.

Kinetic descriptions for electrons, ions, and neutrals in materials processing plasmas are required for modeling both gas-phase and surface chemistry and understanding the effects of complex reactor geometry. Hybrid models that combine analytical, fluid, and kinetic approaches are likely to be effective for use in CAD tools and expert systems.

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